Product » T-UFDSIOW-5-5


Ultra-flat thermal oxide substrate on P{100}silicon chips, 5x5mm, 675µm thickness

Product Description

Ultra-flat  SiO2 substrate. It is a thermally grown amorphous silicondioxide layer on ultra-flat silicon wafer chips. Excellent ultra-flat substrate for high resolution SEM or AFM imaging.  The 25 ultra-flat SiO2 substrates on Si wafer chips are clean-room packaged in a gel box. For detailed information click on the link below.
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