Lateral Calibration Standards

Lateral-(xy)-Calibration Standard (2D200)

Lateral-(xy)-Calibration Standard (2D200)

Standard for Precise Lateral Calibration with 200 nm Pitch
TGXYZ02

TGXYZ02

XYZ Calibration Grating, 100nm Step Height, 5µm and 10µm Pitch
TGX

TGX

Grating with Undercut Edge Structures for Lateral Calibration and Tip Aspect Ratio Determination
CS-20NG

CS-20NG

XYZ Calibration Nanogrid; Arrays with Down to 500nm Pitch; 20nm Height
TGXYZ01

TGXYZ01

XYZ Calibration Grating, 20nm Step Height, 5µm and 10µm Pitch
TGXYZ03

TGXYZ03

XYZ Calibration Grating, 500nm Step Height, 5µm and 10µm Pitch
TGF11

TGF11

Grating with Trapezoid Structures for Lateral Force Calibration and Scanner Nonlinearity Assessment
145TC

145TC

Traceable Calibration Specimen, 1-dimensional, 144 nm nominal period, Al on glass.
150-1D

150-1D

Calibration Specimen, 1-dimensional, 144 nm nominal period, Al on glass.
150-2D

150-2D

Calibration Specimen, 2-dimensional, 144 nm nominal period, Al on Si
300-1D

300-1D

Calibration Specimen, 1-dimensional, 288 nm nominal period, W-coated Photoresist on Si
300-2D

300-2D

Calibration specimen, 2-dimensional, 297 nm nominal period, Aluminum bumps on Si
302-edu

302-edu

Student grade Calibration specimen, 2-dimensional, 297 nm nominal period, Aluminum bumps on Si
301BE

301BE

Calibration Specimen, 1-dimensional, 292 nm nominal period, Ti on Si
70-1D

70-1D

Calibration Specimen, 1-dimensional, 70 nm nominal period, HSQ resist (silicon oxide) on Si.
700-1D

700-1D

Calibration Specimen, 1-dimensional, 700 nm nominal period, W-coated Photoresist on Si
700-2D

700-2D

Calibration specimen, 2-dimensional, 700 nm nominal period, W-coated Photoresist on Si
750-HD

750-HD

750-HD Calibration specimen, 1-Dimensional with Height, 750 nm period, 100 nm height
751-HD

751-HD

Nickel NanoChannel Array Substrate. Width 370 nm, depth 180 nm
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